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Features:
Applications: The xenon flash thermal diffusivity system has been used in the study of factors affecting the properties of materials, such as processing conditions, composition, heat treatments, sintering aids and dopants, composite structure, grain size, and porosity. The technique is applicable to a wide range of materials including glasses, plastics, metals, ceramics, composites, crystals, and foams. The system can measure the same specimen prepared for the laser flash system as well as other geometryâs, including plates, cubes, bars, and irregular shapes. The thermal diffusivity of coatings can also be measured when the density, thickness, and specific heat of both the coating and the substrate are known.
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Diffraction UC | Residual Stress UC | Thermophysical Properties UC Diffraction & Thermophysical Prop. Group | <">High Temperature Materials Laboratory Metals & Ceramics Division | Oak Ridge National Laboratory Acknowledgments URL: http://www.html.ornl.gov/tpuc/x-flash.html |